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Chemical etching behaviors of semipolar (112̄2) and nonpolar (112̄0) gallium nitride films
Jung, Younghun, Baik, Kwang Hyeon, Mastro, Michael A., Hite, Jennifer K., Eddy, Charles R., Kim, JihyunVolume:
16
Language:
english
Journal:
Physical Chemistry Chemical Physics
DOI:
10.1039/C4CP02303J
Date:
June, 2014
File:
PDF, 3.09 MB
english, 2014