Growth of RuO 2 Thin Films by...

Chemistry of Materials 2010 / 10 Vol. 22; Iss. 20

Growth of RuO 2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO 4 Precursor and 5% H 2 Reduction Gas

Han, Jeong Hwan, Lee, Sang Woon, Kim, Seong Keun, Han, Sora, Hwang, Cheol Seong, Dussarrat, Christian, Gatineau, Julien
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Volume:
22
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm101694g
Date:
October, 2010
File:
PDF, 2.44 MB
english, 2010
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