Josephson junction integrated circuit process with...

IEEE Transactions on Appiled Superconductivity 1993 / 3 Vol. 3; Iss. 1

Josephson junction integrated circuit process with planarized PECVD SiO/sub 2/ dielectric

Barfknecht, A.T., Ruby, R.C., Ko, H.L., Lee, G.S.
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Volume:
3
Language:
english
Journal:
IEEE Transactions on Appiled Superconductivity
DOI:
10.1109/77.233940
Date:
March, 1993
File:
PDF, 693 KB
english, 1993
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