Deep-UV Photochemistry and Patterning of...

Deep-UV Photochemistry and Patterning of (Aminoethylaminomethyl)phenethylsiloxane Self-Assembled Monolayers

M.-S. Chen, C. S. Dulcey, L. A. Chrisey, W. J. Dressick
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Volume:
16
Year:
2006
Language:
english
Pages:
10
DOI:
10.1002/adfm.200500744
File:
PDF, 277 KB
english, 2006
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