Bottom-Up Engineering of Subnanometer Copper Diffusion...

Bottom-Up Engineering of Subnanometer Copper Diffusion Barriers Using NH2-Derived Self-Assembled Monolayers

Arantxa Maestre Caro, Silvia Armini, Olivier Richard, Guido Maes, Gustaaf Borghs, Caroline M. Whelan, Youssef Travaly
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Volume:
20
Year:
2010
Language:
english
Pages:
7
DOI:
10.1002/adfm.200902072
File:
PDF, 673 KB
english, 2010
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