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High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays
Seungwoo Lee, Hong Suk Kang, Jung-Ki ParkVolume:
21
Year:
2011
Language:
english
Pages:
9
DOI:
10.1002/adfm.201001927
File:
PDF, 997 KB
english, 2011