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Selective low-temperature chemical vapor deposition of copper from (hexafluoroacetylacetonato)copper(I)trimethylphosphine, (hfa)CuP(Me)3
Prof. Toivo T. Kodas, H.-K. Shin, Dr. K.-M. Chi, Prof. Mark J. Hampden-Smith, John D. Farr, Dr. Mark PaffettVolume:
3
Year:
1991
Language:
english
Pages:
3
DOI:
10.1002/adma.19910030506
File:
PDF, 259 KB
english, 1991