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A sims study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment
E.-A. Knabbe, J.W. Coburn, E. KayVolume:
123
Year:
1982
Language:
english
Pages:
1
DOI:
10.1016/0167-2584(82)90398-x
File:
PDF, 52 KB
english, 1982