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Reaction mechanisms for the photon-enhanced etching of semiconductors: An investigation of the UV-stimulated interaction of chlorine with Si(100)
R.B. Jackman, H. Ebert, J.S. FoordVolume:
176
Year:
1986
Language:
english
Pages:
1
DOI:
10.1016/0167-2584(86)91048-0
File:
PDF, 56 KB
english, 1986