Formation of vanadium silicide by high dose ion implantation
V.P. Salvi, A.M. Narsale, S.V. Vidwans, A.A. Rangwala, L. Guzman, M. Dapor, G. Giunta, L. Calliari, F. MarchettiVolume:
189-190
Year:
1987
Language:
english
Pages:
1
DOI:
10.1016/0167-2584(87)90572-x
File:
PDF, 74 KB
english, 1987