Residual Layer Self-Removal in Imprint Lithography

Residual Layer Self-Removal in Imprint Lithography

Jarrett Dumond, Hong Yee Low
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Volume:
20
Year:
2008
Language:
english
Pages:
7
DOI:
10.1002/adma.200701659
File:
PDF, 261 KB
english, 2008
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