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High-temperature active oxidation of CVD-Si3N4 in ArO2 atmosphere
Takayuki Narushima, Yasutaka Iguchi, Takashi Goto, Toshio Hirai, Yoshio YokoyamaVolume:
53-56
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0167-2738(92)90389-7
File:
PDF, 250 KB
english, 1992