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Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry
Luis M. Campos, Ines Meinel, Rosette G. Guino, Martin Schierhorn, Nalini Gupta, Galen D. Stucky, Craig J. HawkerVolume:
20
Year:
2008
Language:
english
Pages:
6
DOI:
10.1002/adma.200800330
File:
PDF, 529 KB
english, 2008