Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers
Joy Y. Cheng, Charles T. Rettner, Daniel P. Sanders, Ho-Cheol Kim, William D. HinsbergVolume:
20
Year:
2008
Language:
english
Pages:
4
DOI:
10.1002/adma.200800826
File:
PDF, 813 KB
english, 2008