![](/img/cover-not-exists.png)
Oxygen ion-beam etch resistance of metal-free and organosilicon resist materials
Hiroshi Gokan, Yoshitake Ohnishi, Kazuhide SaigoVolume:
1
Year:
1983
Language:
english
Pages:
12
DOI:
10.1016/0167-9317(83)90015-1
File:
PDF, 727 KB
english, 1983