![](/img/cover-not-exists.png)
Submicron lithography and DUV-master masks made by ion projection lithography
G. Stangl, F. Rüdenauer, W. Maurer, W. FallmannVolume:
3
Year:
1985
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(85)90024-3
File:
PDF, 610 KB
english, 1985