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Thermal stability and etching resistance of formaldehyde- and deep UV-hardened photoresists
A. Gutmann, A. Kleinhaus, W. BadeVolume:
3
Year:
1985
Language:
english
Pages:
9
DOI:
10.1016/0167-9317(85)90043-7
File:
PDF, 864 KB
english, 1985