X-ray lithography using a KrF laser-plasma source at hν ≈ 1...

Microelectronic Engineering 1987 Vol. 6; Iss. 1-4

X-ray lithography using a KrF laser-plasma source at hν ≈ 1 keV

Edmond Turcu, Gillian Davis, Malcolm Gower, Fergus O'Neill, Martin Lawless
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
6
Year:
1987
Language:
english
Pages:
6
DOI:
10.1016/0167-9317(87)90051-7
File:
PDF, 298 KB
english, 1987
Conversion to is in progress
Conversion to is failed