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A new silicon nitride mask technology for synchrotron radiation x-ray lithography: First results
C.C.G. Visser, J.E. Uglow, D.W. Burns, G. Wells, R. Redaelli, F. Cerrina, H. GuckelVolume:
6
Year:
1987
Language:
english
Pages:
6
DOI:
10.1016/0167-9317(87)90053-0
File:
PDF, 313 KB
english, 1987