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A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
E. Babich, J. Shaw, M. Hatzakis, J. Paraszczak, R.W. Lenz, P.R. DvornichVolume:
6
Year:
1987
Language:
english
Pages:
8
DOI:
10.1016/0167-9317(87)90081-5
File:
PDF, 218 KB
english, 1987