Resolution limits of optical methods for the...

Resolution limits of optical methods for the defectinspection of lithography masks

A. Kluwe, S. Rauthenberg, F. Fandrich, R. Ludwig, K.-H. Müller
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Volume:
9
Year:
1989
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(89)90092-0
File:
PDF, 367 KB
english, 1989
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