Materials and processes for imaging at the resolution...

Microelectronic Engineering 1989 Vol. 9; Iss. 1-4

Materials and processes for imaging at the resolution limits of optical lithography

Gary N. Taylor, Omkaran Nalamasu, Larry E. Stillwagon
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Volume:
9
Year:
1989
Language:
english
Pages:
16
DOI:
10.1016/0167-9317(89)90112-3
File:
PDF, 3.63 MB
english, 1989
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