Towards an optimized image reversal process for half micron...

Microelectronic Engineering 1989 Vol. 9; Iss. 1-4

Towards an optimized image reversal process for half micron lithography

M.E. Reuhman-Huisken, C.M.J. Mutsaers, F.A. Vollenbroek, J.A.H.M. Moonen
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Volume:
9
Year:
1989
Language:
english
Pages:
6
DOI:
10.1016/0167-9317(89)90118-4
File:
PDF, 955 KB
english, 1989
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