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Impact of silicon surface characteristics on MOS device yield for ULSI
M. Heyns, C. Hasenack, R. De Keersmaecker, R. FalsterVolume:
10
Year:
1991
Language:
english
Pages:
23
DOI:
10.1016/0167-9317(91)90025-9
File:
PDF, 2.27 MB
english, 1991