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Highly sensitive positive deep UV resist utilizing a sulfonate acid generator and a tetrahydropyranyl inhibitor
Leo Schlegel, Takumi Ueno, Hiroshi Shiraishi, Nobuaki Hayashi, Takao IwayanagiVolume:
13
Year:
1991
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(91)90042-c
File:
PDF, 281 KB
english, 1991