Proximity E-beam exposure in submicron patterns using a silylation process
Thierry G. Vachette, Patrick J. Paniez, Frederic Lalanne, Michel MadoreVolume:
13
Year:
1991
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(91)90078-r
File:
PDF, 357 KB
english, 1991