E-beam written optically transparent x-ray masks: Four...

Microelectronic Engineering 1992 Vol. 17; Iss. 1-4

E-beam written optically transparent x-ray masks: Four levels for an industrial VLSI chip with megabit design rules

Ch. Ehrlich, B. Breithaupt, R. Demmeler, E.P. Jacobs, C. Köhler, K. Kohlmann, M. Petschner, K. Reimer
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Volume:
17
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(92)90033-n
File:
PDF, 332 KB
english, 1992
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