Natural masking for producing sub-10-nm silicon nanowires

Microelectronic Engineering 1995 Vol. 27; Iss. 1-4

Natural masking for producing sub-10-nm silicon nanowires

M. Gotza, B. Saint-Cricq, M. Dutoit, P.-H. Jouneau
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Volume:
27
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)00072-3
File:
PDF, 1.10 MB
english, 1995
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