Multilayer coated reflective optics for Extreme UV lithography
E. Louis, H.-J. Voorma, N.B. Koster, F. Bijkerk, Yu.Ya. Platonov, S.Yu. Zuev, S.S. Andreev, E.A. Shamov, N.N. SalashchenkoVolume:
27
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)00096-d
File:
PDF, 260 KB
english, 1995