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Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications
D.M. Tennant, K. Feder, K.F. Dreyer, R.P. Gnall, T.L. Koch, U. Koren, B.I. Miller, M.G. YoungVolume:
27
Year:
1995
Language:
english
Pages:
8
DOI:
10.1016/0167-9317(94)00139-l
File:
PDF, 1.57 MB
english, 1995