Low temperature etching of Si in high density plasma using SF6/O2
Johann W. Bartha, Johann Greschner, M. Puech, P. MaquinVolume:
27
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)00144-j
File:
PDF, 465 KB
english, 1995