Reactive ion etching of silicon submicron-sized trenches in...

Microelectronic Engineering 1995 Vol. 27; Iss. 1-4

Reactive ion etching of silicon submicron-sized trenches in SF6/C2Cl3F3 plasma

V.A. Yunkin, D. Fischer, E. Voges
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
27
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)00146-l
File:
PDF, 1.20 MB
english, 1995
Conversion to is in progress
Conversion to is failed