Integration of plasma cleaning and light-assisted CVD for...

Microelectronic Engineering 1994 Vol. 25; Iss. 2-4

Integration of plasma cleaning and light-assisted CVD for the passivation of III–V semiconductor surfaces

Olivier Dulac, Yves I. Nissim
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Volume:
25
Year:
1994
Language:
english
Pages:
11
DOI:
10.1016/0167-9317(94)90025-6
File:
PDF, 785 KB
english, 1994
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