Optimum switching time for a beam-size switch (250 nm ⇔ 1000 nm) in a vector scan electron beam lithography machine
E. Koets, P. Kruit, T. ChisholmVolume:
23
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)90108-2
File:
PDF, 431 KB
english, 1994