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“Direct write” pattern placement accuracy for E-beam nanolithography
K. Reimer, Ch. Ehrlich, C. Köhler, W. BrüngerVolume:
23
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(94)90112-0
File:
PDF, 330 KB
english, 1994