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Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
R. Viswanathan, D. Seeger, A. Bright, T. Bucelot, A. Pomerene, K. Petrillo, P. Blauner, P. Agnello, J. Warlaumont, J. Conway, D. PatelVolume:
23
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0167-9317(94)90148-1
File:
PDF, 485 KB
english, 1994