DUV-E-beam Mix and Match lithography in a single mask for...

Microelectronic Engineering 1996 Vol. 30; Iss. 1-4

DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID device

B.J. Vleeming, J.L.T.R. Leene, E. van der Drift, J. Romijn
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Volume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00200-6
File:
PDF, 791 KB
english, 1996
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