Large-field (> 20 × 25 mm2) replication by EUV lithography
Tsuneyuki Haga, Marcia C.K. Tinone, Hisataka Takenaka, Hiroo KinoshitaVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00221-9
File:
PDF, 1.11 MB
english, 1996