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Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks
F. Bijkerk, L.A. Shmaenok, E. Louis, H.J. Voorma, N.B. Koster, C. Bruineman, R.K.F.J. Bastiaensen, E.W.J.M. van der Drift, J. Romijn, L.E.M. de Groot, B.A.C. Rousseeuw, T. Zijlstra, Yu.Ya. Platonov, NVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00222-7
File:
PDF, 303 KB
english, 1996