Fabrication of 200nm field effect transistors by X-ray lithography using a laser-plasma X-ray source
C.M. Reeves, I.C.E. Turcu, J.T.M. Stevenson, A.W.S. Ross, A.M. Gundlach, P. Prewett, R.A. Lawes, P. Anastasi, R. Burge, P. MichellVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00223-5
File:
PDF, 1.07 MB
english, 1996