Thermal and mechanical analysis of photoresist and...

Microelectronic Engineering 1996 Vol. 30; Iss. 1-4

Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214™

E. Gogolides, E. Tegou, K. Beltsios, K. Papadokostaki, M. Hatzakis
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Volume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00242-1
File:
PDF, 292 KB
english, 1996
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