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Realisation of irregular quarter-micron patterns in thick resists using an advanced e-beam sensitive TSI process
M. Irmscher, B. Höfflinger, R. SpringerVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00250-2
File:
PDF, 1.11 MB
english, 1996