Electron beam lithography using chemically-amplified resist: Resolution and profile control
V.A. Kudryashov, V.V. Krasnov, S.E. Huq, P.D. Prewett, T.J. HallVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00251-0
File:
PDF, 1.77 MB
english, 1996