Investigation of SiSiGe heterostructures patterned by reactive ion etching
T. Köster, B. Hadam, J. Gondermann, B. Spangenberg, H.G. Roskos, H. Kurz, J. Brunner, G. AbstreiterVolume:
30
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00259-6
File:
PDF, 870 KB
english, 1996