The application of high energy ion implantation for silicon...

The application of high energy ion implantation for silicon radiation detectors

J. von Borany, B. Schmidt, R. Grötzschel
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Volume:
377
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/0168-9002(96)00235-5
File:
PDF, 503 KB
english, 1996
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