Self-aligned CoSi2 and TiW(N) local interconnect in a submicron CMOS process
R.D.J. Verhaar, A.A. Bos, J.M.F.G. Van Laarhoven, H. Kraaij, R.A.M. WoltersVolume:
38
Year:
1989
Language:
english
Pages:
9
DOI:
10.1016/0169-4332(89)90567-9
File:
PDF, 749 KB
english, 1989