![](/img/cover-not-exists.png)
Lateral diffusion of dopants in a 1 μm N+/P+ polycide gate CMOS process
D. Lévy, D.T. Amm, G. Göltz, J. Torrès, P. Delpech, T. Ternisien D'Ouville, H. Mingam, R. StuckVolume:
38
Year:
1989
Language:
english
Pages:
9
DOI:
10.1016/0169-4332(89)90569-2
File:
PDF, 417 KB
english, 1989