CW CO2 laser CVD of amorphous hydrogenated silicon (a-Si:H): influence of the deposition geometry
E. Golusda, R. Lange, K.-D. Lühmann, G. Mollekopf, M. Wacker, H. StafastVolume:
54
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(92)90012-m
File:
PDF, 272 KB
english, 1992