Rapid thermal chemical vapour deposition of SiOxNy films
F. Lebland, C. Licoppe, Y. Gao, Y.I. Nissim, S. RigoVolume:
54
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(92)90031-r
File:
PDF, 285 KB
english, 1992