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Influence of epitaxy on the low temperature silicon diffusion through gold layers
A. Cros, H. Dallaporta, J.C. OberlinVolume:
56-58
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0169-4332(92)90266-z
File:
PDF, 690 KB
english, 1992